Precision Production Facility’ Design Inside Established Urban Areas

Abstract

The article discusses the fundamental principles of design and criteria for the placement of high-precision production facilities designed to produce microelectronic components and study micron and submicron structures. The main aspect of the article is made on protection from vibration of natural and man-made origin, present in almost any place of construction. The main goal of vibration minimization is to prevent the occurrence of oscillations that can distort measurement data and disrupt the operation of high-precision equipment, such as electron microscopes, lithographic installations and nanometer control systems. The current requirement for vibration is the maximum permissible vibration velocity from 3 μm/s to 0.5 μm/s or less, depending on the equipment and research purposes. Vibrations transmitted through building structures should be minimized by using isolated foundations, vibration-insulating materials and active vibration isolation systems.